{"product_id":"9780819475602","title":"Optical Lithography: Here is Why","description":"\u003cp\u003eThis book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.\u003cbr\u003e\u003cbr\u003eTopics include:\u003cbr\u003e\u003cbr\u003e•  Exposure Systems\u003cbr\u003e•  Image Formation\u003cbr\u003e•  The Meter of Lithography\u003cbr\u003e•  Components in Optical Lithography\u003cbr\u003e•  Processing and Optimization\u003cbr\u003e•  Immersion Lithography\u003cbr\u003e•  Outlook for optical lithography\u003cbr\u003e\u003cbr\u003eBurn Lin is editor-in-chief of the Journal of Micro\/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 75 articles, and holder of 37 U.S. patents.  \u003c\/p\u003e","brand":"SPIE Press","offers":[{"title":"Default Title","offer_id":47007993757936,"sku":"9780819475602","price":86.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9780819475602_p0.jpg?v=1763749874","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9780819475602","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}