{"product_id":"9780819485182","title":"Field Guide to Optical Lithography","description":"The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.","brand":"SPIE Press","offers":[{"title":"Default Title","offer_id":47130084770032,"sku":"9780819485182","price":36.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9780819485182_p0.jpg?v=1763749878","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9780819485182","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}