{"product_id":"9780841227217","title":"Polymers for Microelectronics: Resists and Dielectrics","description":"\u003cp\u003ePresents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.\u003cbr\u003e\u003c\/p\u003e","brand":"American Chemical Society","offers":[{"title":"Default Title","offer_id":47018378559728,"sku":"9780841227217","price":25.0,"currency_code":"USD","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9780841227217_p0.jpg?v=1763824635","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9780841227217","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}