{"product_id":"9780841233324","title":"Microelectronics Technology: Polymers for Advanced Imaging and Packaging","description":"\u003cp\u003eProvides an up-to-date assessment of chemically amplified resist materials chemistry and process considerations. Reports novel chemistry for single layer 193nm lithographic applications. Discusses new approaches to silicon-containing resists and multilevel processes. Explores the design of low-dielectric polymer materials for microelectronic applications.\u003cbr\u003e\u003c\/p\u003e","brand":"American Chemical Society","offers":[{"title":"Default Title","offer_id":47027163627760,"sku":"9780841233324","price":79.5,"currency_code":"USD","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9780841233324_p0.jpg?v=1763827773","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9780841233324","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}