{"product_id":"9781118601143","title":"Silicon Technologies: Ion Implantation and Thermal Treatment","description":"The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.\u003cbr\u003e \u003cbr\u003e","brand":"Wiley","offers":[{"title":"Default Title","offer_id":47121521410288,"sku":"9781118601143","price":165.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9781118601143_p0.jpg?v=1763694607","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9781118601143","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}