{"product_id":"9781118602805","title":"Ferroelectric Dielectrics Integrated on Silicon","description":"This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.\u003cbr\u003e After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films.","brand":"Wiley","offers":[{"title":"Default Title","offer_id":47121643929840,"sku":"9781118602805","price":219.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9781118602805_p0.jpg?v=1763694741","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9781118602805","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}