{"product_id":"9781118747384","title":"Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, 2nd Edition","description":"Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.","brand":"Wiley","offers":[{"title":"Default Title","offer_id":47130461667568,"sku":"9781118747384","price":206.95,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9781118747384_p0.jpg?v=1763695166","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9781118747384","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}