{"product_id":"9783527646364","title":"High-k Gate Dielectrics for CMOS Technology","description":"A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological\u003cbr\u003e viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these\u003cbr\u003e materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.\u003cbr\u003e \u003cbr\u003e Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections\u003cbr\u003e with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.","brand":"Wiley","offers":[{"title":"Default Title","offer_id":47176491565296,"sku":"9783527646364","price":224.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0737\/7593\/9824\/files\/9783527646364_p0.jpg?v=1772808051","url":"https:\/\/shop-qa.barnesandnoble.com\/products\/9783527646364","provider":"Barnes \u0026 Noble (DEV)","version":"1.0","type":"link"}