Optical Lithography: Here is Why

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.

Topics include:

• Exposure Systems
• Image Formation
• The Meter of Lithography
• Components in Optical Lithography
• Processing and Optimization
• Immersion Lithography
• Outlook for optical lithography

Burn Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 75 articles, and holder of 37 U.S. patents.